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Selective Pore-Sealing of Highly Porous Ultralow-k dielectrics for ULSI Interconnects by Cyclic Initiated Chemical Vapor Deposition Process
Journal
2018 Symposium on VLSI Technology
Author
Seong Jun Yoon, Kwanyong Pak, Hyun Jun Ahn, Alexander Yoon, Sung Gap Im, and Byung Jin Cho
Year
2018
Date
June 18-22, 2018.
File
921cb5d0fd18603339629033ea4a9cc5.png (1.2M) 3회 다운로드 DATE : 2020-12-02 13:50:24
Seong Jun Yoon, Kwanyong Pak, Hyun Jun Ahn, Alexander Yoon, Sung Gap Im, and Byung Jin Cho, "Selective Pore-Sealing of Highly Porous Ultralow-k dielectrics for ULSI Interconnects by Cyclic Initiated Chemical Vapor Deposition Process", 2018 Symposium on VLSI Technology, Hawaii, USA, June 18-22, 2018.