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Impact of interfacial layer control using Gd2O3 in HfO2 gate dielectric
Journal
Appl. Phys. Lett.
Author
G. K. Kalapati, Y. Tong, W. Y. Loh, H. K. Mun, and B. J. Cho
Year
2007
Date
May. 2007.

G.K.Kalapati, Y.Tong, W.Y.Loh, H.K.Mun, and B.J.Cho, "Impact of interfacial layer control using Gd2O3 in HfO2 gate dielectric," Appl. Phys. Lett., vol. 90, p. 183510, May. 2007.