Journals

  • Home
  • Publication
  • Journals
Integrated high K (K~19) MIM capacitor with Cu/Low-K interconnects for RF application
Journal
IEEE Electron Device Lett.
Author
M. B. Yu, Y. Z. Xiong, S. J. Kim, S. Balakumar, C. Zhu, M. F. Li, B. J. Cho, G. Q. Lo, N. Balasubramanian, and D. L. Kwong
Year
2005
Date
Nov. 2005.

M. B. Yu, Y. Z. Xiong, S. J. Kim, S. Balakumar, C. Zhu, M. F. Li, B. J. Cho, G. Q. Lo, N. Balasubramanian, and D. L. Kwong, "Integrated high K (K~19) MIM capacitor with Cu/Low-K interconnects for RF application," IEEE Electron Device Lett., vol. 26, no. 11, pp. 793-795, Nov. 2005.