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Charge Trapping and Breakdown Mechanism in HfAlO/TaN Gate Stack Analyzed using Carrier Separation
Journal
IEEE Trans. Dev. Mat. Rel.
Author
W. Y. Loh, B. J. Cho, M. S. Joo, M. F. Li, D. S. H. Chan, S. Mathew, and D. L. Kwong
Year
2004
Date
Dec. 2004.

W. Y. Loh, B. J. Cho, M. S. Joo, M. F. Li, D. S. H. Chan, S. Mathew, and D. L. Kwong, "Charge Trapping and Breakdown Mechanism in HfAlO/TaN Gate Stack Analyzed using Carrier Separation," IEEE Trans. Dev. Mat. Rel., vol. 4, no. 4, pp. 696-703, Dec. 2004.