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Thermally Stable Fully Silicided Hf-Silicide Metal Gate Electrode
Journal
IEEE Electron Device Lett.
Author
C. S. Park, B. J. Cho, and D.-L. Kwong
Year
2004
Date
Jun. 2004.

C. S. Park, B. J. Cho, and D.-L. Kwong, "Thermally Stable Fully Silicided Hf-Silicide Metal Gate Electrode," IEEE Electron Device Lett., vol. 25, no. 6, pp. 372-374, Jun. 2004.