Al2O3/Ge-On-Insulator n- and p-MOSFETs with Fully NiSi and NiGe Dual Gates
- Journal
- IEEE Electron Device Lett.
- Year
- 2004
D. S. Yu, C. H. Huang, Albert Chin, C. Zhu, M. F. Li, B. J. Cho, and D. L. Kwong, "Al2O3/Ge-On-Insulator n- and p-MOSFETs with Fully NiSi and NiGe Dual Gates," IEEE Electron Device Lett., vol. 25, no. 3, pp. 138-140, Mar. 2004.
