Journals

  • Home
  • Publication
  • Journals
Boron profile narrowing in laser processed silicon after rapid thermal anneal
Journal
J. Electrochem. Soc.
Author
C. H. Poon, L. S. Tan, B. J. Cho, A. See, and M. Bhat
Year
2004
Date
Jan. 2004.

C. H. Poon, L. S. Tan, B. J. Cho, A. See, and M. Bhat, "Boron profile narrowing in laser processed silicon after rapid thermal anneal," J. Electrochem. Soc., vol. 151, no. 1, pp. G80-G83, Jan. 2004.