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Improvement of electrical properties of MOCVD HfO2 by multi-step deposition process
Journal
Electrochem. and Solid-State Lett.
Author
C. C. Yeo, B. J. Cho, M. S. Joo, S. J. Whoang, and D. L. Kwong
Year
2003
Date
Nov. 2003.

C. C. Yeo, B. J. Cho, M. S. Joo, S. J. Whoang, and D. L. Kwong, “Improvement of electrical properties of MOCVD HfO2 by multi-step deposition process”, Electrochem. and Solid-State Lett., vol. 6, no. 11, pp. F42-F44, Nov. 2003.