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MIM capacitors using Atomic-Layer-Deposited high-K (HfO2)1-x(Al2O3)x dielectrics
Journal
IEEE Electron Device Lett.
Author
H. Hu, C. Zhu, X. Yu, A. Chin, M. F. Li, B. J. Cho, D. L. Kwong, P. D. Foo, M. B. Yu
Year
2003
Date
Feb. 2003.

H. Hu, C. Zhu, X. Yu, A. Chin, M. F. Li, B. J. Cho, D. L. Kwong, P. D. Foo, M. B. Yu, "MIM capacitors using Atomic-Layer-Deposited high-K (HfO2)1-x(Al2O3)x dielectrics", IEEE Electron Device Lett., vol. 24, no. 2, pp. 60-62, Feb. 2003.