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Rapid thermal annealing of high dose BF2 implanted silicon
Journal
J. Kor. Appl. Phys.
Author
B. J. Cho and C. K. Kim
Year
1989
Date
Nov. 1989

B. J. Cho and C. K. Kim, "Rapid thermal annealing of high dose BF2 implanted silicon", J. Kor. Appl. Phys., vol. 2, no. 4, pp. 407, Nov. 1989.