Effect of ZrO2 interfacial layer on forming ferroelectric HfxZryOz on Si substrate
- Journal
- AIP Advances
- Vol
- 9 (12)
- Page
- 125020. 1-125020. 4
- Year
- 2019
Sang Jae Lee, Min Ju Kim, Tae Yoon Lee, Tae In Lee, Jae Hoon Bong, Sung Won Shin, Seong Ho Kim, Wan Sik Hwang, and Byung Jin Cho, "Effect of ZrO2 interfacial layer on forming ferroelectric HfxZryOz on Si substrate", AIP Advances, vol. 9, no. 12, pp. 125020. 1-125020. 4, Dec. 2019.
