Ultrathin ZrOx-Organic Hybrid Dielectric (EOT 3.2 nm) via Initiated Chemical Vapor Deposition for High-Performance Flexible Electronics
- Journal
- ACS Applied Materials & Interfaces
- Vol
- 11 (47)
- Page
- 44513-44520
- Year
- 2019
Min Ju Kim, Kwanyong Pak, Junhwan Choi, Tae In Lee, Wan Sik Hwang, Sung Gap Im, and Byung Jin Cho, "Ultrathin ZrOx-Organic Hybrid Dielectric (EOT 3.2 nm) via Initiated Chemical Vapor Deposition for High-Performance Flexible Electronics", ACS Applied Materials & Interfaces, vol. 11, no. 47, pp. 44513-44520, Nov. 2019.
