Investigation of border trap characteristics in the AlON/GeO2/Ge gate stacks
- Journal
- IEEE Transactions on Electron Devices
- Year
- 2017
Yujin Seo, Choog Ki Kim, Tae In Lee, Wan Sik Hwang, Hyun-Yong Yu, Yang Kyu Choi and Byung Jin Cho, "Investigation of border trap characteristics in the AlON/GeO2/Ge gate stacks", IEEE Transactions on Electron Devices, Vol. 64, No. 10, 3998-4001, October,. 2017