AES study of rapid thermal boron diffusion into silicon from a solid diffusion source in oxygen ambient
- Journal
- J. Electrochem. Soc
- Year
- 1990
J. G. Kim, B. J. Cho, and C. K. Kim, "AES study of rapid thermal boron diffusion into silicon from a solid diffusion source in oxygen ambient", J. Electrochem. Soc., vol. 137, no. 9, pp. 2857-2860, Sep. 1990.