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Total 2건 1 페이지

1996
2

"Shallow p+ -n junction formation by Ge pre-amorphization and additional RTA" J. G. Oh, K. H. Lee, B. J. Cho, and J. C. Kim, J. Kor. Appl. Phys., Jul. 1996..
1

"Nano-trenched local oxidation of silicon isolation using island polysilicon grains" S. K. Kwon, C. Lim, B. J. Cho, and J. C. Kim, J. Electrochem. Soc, Feb. 1996..

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