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Evaluation of double spacer local oxidation of silicon (LOCOS) isolation for sub-quarter micron design rule
Journal
Jpn. J. Appl. Phys.
Author
S. A. Jang, Y. B. Kim, B. J. Cho, and J. C. Kim
Year
1997
Date
Mar. 1997.

S. A. Jang, Y. B. Kim, B. J. Cho, and J. C. Kim, "Evaluation of double spacer local oxidation of silicon (LOCOS) isolation for sub-quarter micron design rule", Jpn. J. Appl. Phys., vol. 36, no. 3b, pp. 1433-1438, Mar. 1997.