Journals

  • Home
  • Publication
  • Journals
Impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity
Journal
J. Electrochem. Soc.
Author
B. J. Cho, L. H. Ko, Y. A. Nga, and L. H. Chan
Year
1999
Date
Nov. 1999.

B. J. Cho, L. H. Ko, Y. A. Nga, and L. H. Chan, "Impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity", J. Electrochem. Soc., vol. 146, no. 11, pp. 4259-4262, Nov. 1999.