Origin of temperature-sensitive hole current at low gate voltage regime in ultrathin gate oxide
- Journal
- J. Appl. Phys.
- Year
- 2000
C. H. Ang, C. H. Ling, Z. Y. Cheng, and B. J. Cho, "Origin of temperature-sensitive hole current at low gate voltage regime in ultrathin gate oxide", J. Appl. Phys., vol. 88, no. 5, pp. 2872-2876, Sep. 2000.
