A comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation
- Journal
- Solid-State Electron.
- Year
- 2000
B. J. Cho, S. J. Kim, C. H. Ling, M. S. Joo, and I. S. Yeo, "A comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation", Solid-State Electron., vol. 44, no. 7, pp. 1289-1292, Jul. 2000.