Investigation of reliability degradation of ultra-thin gate oxides irradiated under electron-beam lithography conditions
- Journal
- Jpn. J. Appl. Phys.
- Year
- 2000
P. F. Chong, B. J. Cho, E. F. Chor, M. S. Joo, and I. S. Yeo, "Investigation of reliability degradation of ultra-thin gate oxides irradiated under electron-beam lithography conditions", Jpn. J. Appl. Phys., vol. 39, no. 4B, pp. 2181-2185, Apr. 2000.