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Reliability of thin gate oxides irradiated under X-ray lithography conditions
Journal
Jpn. J. Appl. Phys.
Author
B. J. Cho, S. J. Kim, C. H. Ang, C. H. Ling, M. S. Joo, and I. S. Yeo
Year
2001
Date
Apr. 2001.

B. J. Cho, S. J. Kim, C. H. Ang, C. H. Ling, M. S. Joo, and I. S. Yeo, "Reliability of thin gate oxides irradiated under X-ray lithography conditions", Jpn. J. Appl. Phys., vol. 40, no. 4B, pp. 2819-2822, Apr. 2001.>