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Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs
Journal
Semiconduct. Sci. Technol.
Author
C. M. Lek, B. J. Cho, C. H. Ang, S. S. Tan, W. Y. Loh, J. Z. Zhen, and C. Lap
Year
2002
Date
Jun. 2002.

C. M. Lek, B. J. Cho, C. H. Ang, S. S. Tan, W. Y. Loh, J. Z. Zhen, and C. Lap, "Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs", Semiconduct. Sci. Technol., vol. 17, pp. L25-L28, 2002.