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Negative bias temperature instability on plasma-nitrided silicon dioxide film
Journal
Jpn. J. Appl. Phys.
Author
C. H. Ang, C. M. Lek, S. S. Tan, B. J. Cho, T. Chen, W. Lin, and J. Z. Zhen
Year
2002
Date
Mar. 2002.

C. H. Ang, C. M. Lek, S. S. Tan, B. J. Cho, T. Chen, W. Lin, and J. Z. Zhen, "Negative bias temperature instability on plasma-nitrided silicon dioxide film", Jpn. J. Appl. Phys., vol. 41, no. 3B, pp. L314-L316, Mar. 2002.