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PVD HfO2 for high precision MIM capacitor applications
Journal
EEE Electron Device Lett.
Author
S. J. Kim, B. J. Cho, M. F. Li, Albert Chin, and D. L. Kwong
Year
2003
Date
Jun. 2003.

S. J. Kim, B. J. Cho, M. F. Li, Albert Chin, and D. L. Kwong, “PVD HfO2 for high precision MIM capacitor applications”, IEEE Electron Device Lett., vol. 24, no. 6, p. 387, Jun. 2003.