Journals

  • Home
  • Publication
  • Journals
Physical and electrical characterization of HfO2 Metal-Insulator-Metal capacitors for Si analog circuit applications
Journal
J. Appl. Phys.
Author
H.Hu, C. Zhu, Y. F. Lu, Y. H. Wu, T. Liew, M. F. Li, B. J. Cho, W. K. Choi, and N. Yakovlev
Year
2003
Date
Jul. 2003.

H.Hu, C. Zhu, Y. F. Lu, Y. H. Wu, T. Liew, M. F. Li, B. J. Cho, W. K. Choi, and N. Yakovlev, "Physical and electrical characterization of HfO2 Metal-Insulator-Metal capacitors for Si analog circuit applications," J. Appl. Phys., vol. 94, no. 1, p. 551, 2003.