Journals

  • Home
  • Publication
  • Journals
Multiple-pulse laser annealing of preamorphized silicon for ultrashallow boron junction formation
Journal
J. Vacuum Sci. Technol. B
Author
C. H. Poon, B. J. Cho, Y. F. Lu, M. Bhat, and A. See
Year
2003
Date
Feb. 2003.

C. H. Poon, B. J. Cho, Y. F. Lu, M. Bhat, and A. See, "Multiple-pulse laser annealing of preamorphized silicon for ultrashallow boron junction formation", J. Vacuum Sci. Technol. B, vol. 21, no. 2, pp. 706-709, Mar/Apr. 2003.