A high density MIM capacitor (13fF/um2) using ALD HfO2 dielectrics
- Journal
- IEEE Electron Device Lett.
- Year
- 2003
X. Yu, C. Zhu, H. Hu, A. Chin, M. F. Li, B. J. Cho, D. L. Kwong, P. D. Foo, M. B. Yu, "A high density MIM capacitor (13fF/um2) using ALD HfO2 dielectrics", IEEE Electron Device Lett., vol. 24, no. 2, pp. 63-65, Feb. 2003.
