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Channel mobility degradation and charge trapping in high-K/metal gate NMOSFETs
Journal
Thin Solid Films
Author
S. Mathew, L. K. Bera, N. Balasubramanian, M. S. Joo, and B. J. Cho
Year
2004
Date
Sep. 2004.

S. Mathew, L. K. Bera, N. Balasubramanian, M. S. Joo, and B. J. Cho, "Channel mobility degradation and charge trapping in high-K/metal gate NMOSFETs," Thin Solid Films, vol. 462-463, pp. 11-14, Sep. 2004.