Journals

  • Home
  • Publication
  • Journals
Dopant loss mechanism in n+/p germanium junctions during rapid thermal annealing
Journal
J. Electrochem. Soc.
Author
C. H. Poon, L. S. Tan, B. J. Cho, and A. Y. Du
Year
2005
Date
Oct. 2005.

C. H. Poon, L. S. Tan, B. J. Cho, and A. Y. Du, "Dopant loss mechanism in n+/p germanium junctions during rapid thermal annealing," J. Electrochem. Soc., vol. 152, no. 12, pp. G895-G899, Dec. 2005.