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Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor depositioin
Journal
J. Appl. Phys.
Author
X. Chen, Y. Lu, L. J. Tang, Y. H. Wu, B. J. Cho, S. J. Xu, J. R. Dong, and W. D. Song
Year
2005
Date
Jan. 2005.

X. Chen, Y. Lu, L. J. Tang, Y. H. Wu, B. J. Cho, S. J. Xu, J. R. Dong, and W. D. Song, "Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor depositioin," J. Appl. Phys., vol. 97, no. 1, p. 1 Jan. 2005.