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Total 7건 1 페이지

2006
7

"Correlation between optical properties and Si nanocrystal formation of Si-rich Si oxide films prepared by plasma-enhanced chemical vapor deposition" X. Y. Chen, Y. F. Lu, Y. H. Wu, B. J. Cho, L. J. Tang, D. Lu, and J. R. Dong, Applied Surface Science, Dec. 2006..
6

"Effects of SiO2/Si3N4 hard masks on etching properties of metal gates" W. S. Hwang, B. J. Cho, and D. S. H. Chan, V. Bliznetsov, and W. J. Yoo, J. Vacuum sci. & technol., Dec 2006..
5

"SiGe on Insulator Metal-Oxide-Semiconductor-Field-Effect-Transistor integrated with Schottky Source/Drain and HfO2/TaN Gate Stack" F.Gao, S. J. Lee, R. Li, B. J. Cho, S. Balakumar, Chih-Hang Tung, D. Z. Chi, and D. L. Kwong, Electrochem. and Solid-State Lett., Jul. 2006..
4

"Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2 gate dielectric" C. C. Yeo, B. J. Cho, M. H. Lee, C. W. Liu, K. J. Choi, and T. W. Lee, Semiconductor sci. and technol., May. 2006..
3

"Interface configuration and Fermi-level pinning of fully silicided gate and high-K dielectric stack" M. S. Joo, C. S. Park, B. J. Cho, N. Balasubramanian, and D. L. Kwong, J. Vacuum sci. & technol. B, May. 2006..
2

"Hafnium Aluminum Oxide as charge storage and blocking layers in SONOS type Non-volatile memory for high speed operation" Y. N. Tan, W. K. Chim, W. K. Choi, M. S. Joo, and B. J. Cho, IEEE Trans. Electron Devices, Apr. 2006..
1

"Atomic Layer Deposited High-κ Films and Their Role in Metal-Insulator-Metal Capacitors for Si RF/Analog Integrated Circuit Applications" Chunxiang Zhu, B. J. Cho, and M. F. Li, Chemical Vapor Deposition, Mar. 2006..

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