Atomic Layer Deposited High-κ Films and Their Role in Metal-Insulator-Metal Capacitors for Si RF/Analog Integrated Circuit Applications
- Journal
- Chemical Vapor Deposition
- Year
- 2006
Chunxiang Zhu, B‐J Cho, M‐F Li, "Atomic Layer Deposited High-κ Films and Their Role in Metal-Insulator-Metal Capacitors for Si RF/Analog Integrated Circuit Applications", Chemical Vapor Deposition, vol. 12, no. 2-3, pp. 165-171, Mar. 2006.