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Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2 gate dielectric
Journal
Semiconductor sci. and technol.
Author
C. C. Yeo, B. J. Cho, M. H. Lee, C. W. Liu, K. J. Choi, and T. W. Lee
Year
2006
Date
May. 2006.

C. C. Yeo, B. J. Cho, M. H. Lee, C. W. Liu, K. J. Choi, and T. W. Lee, "Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2 gate dielectric," Semiconductor sci. and technol., vol. 21, pp. 665-669, May. 2006.