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Effects of SiO2/Si3N4 hard masks on etching properties of metal gates
Journal
J. Vacuum sci. & technol.
Author
W. S. Hwang, B. J. Cho, and D. S. H. Chan, V. Bliznetsov, and W. J. Yoo
Year
2006
Date
Dec 2006.

W. S. Hwang, B. J. Cho, and D. S. H. Chan, V. Bliznetsov, and W. J. Yoo, "Effects of SiO2/Si3N4 hard masks on etching properties of metal gates," J. Vacuum sci. & technol. B, vol. B 24 (6), pp. 2689-2694, Nov/Dec 2006.