Border-Trap CharacteNrization in High-K Strained-Si MOSFETs
- Journal
- IEEE Electron Device Lett.
- Year
- 2007
D.Maji, S.P.Duttagupta, V.R.Rao, C.C.Yeo, and B.J.Cho, "Border-Trap CharacteNrization in High-K Strained-Si MOSFETs," IEEE Electron Device Lett., vol. 28, no.8, pp. 731-711, Aug. 2007.
