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Electrical and Interfacial Characterization of Atomic Layer Deposited High-K Gate Dielectrics on GaAs for Advanced CMOS Devices
Journal
IEEE Trans. on Electron. Devices
Author
G.K.Dalapati, Y.Tong, W.Y.Loh, H.K.Mun, and B.J.Cho
Year
2007
Date
Aug. 2007.

G.K.Dalapati, Y.Tong, W.Y.Loh, H.K.Mun, and B.J.Cho, "Electrical and Interfacial Characterization of Atomic Layer Deposited High-K Gate Dielectrics on GaAs for Advanced CMOS Devices", IEEE Trans. on Electron. Devices, vol. 54, no. 8, pp. 1831-1837, Aug. 2007.