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Effects of Volatility of Etch By-products on Surface Roughness During Etching of Metal Gates in Cl2
Journal
J. Electrochem. Soc.
Author
W. S. Hwang, B. J. Cho, D.S.H. Chan, S. W. Lee, and W. J. Yoo
Year
2008
Date
Jan. 2008.

W. S. Hwang, B. J. Cho, D.S.H. Chan, S. W. Lee, and W. J. Yoo, “Effects of Volatility of Etch By-products on Surface Roughness During Etching of Metal Gates in Cl2”, J. Electrochem. Soc., vol. 155, no. 1, pp. H6-H10, Jan. 2008.