Process and Material Properties of HfLaOx Prepared by Atomic Layer Deposition
- Journal
- J. Electrochem. Soc.
- Year
- 2008
W. He, D. S. H. Chan, S. J. Kim, Y. S. Kim, S. T. Kim, and B. J. Cho, “Process and Material Properties of HfLaOx Prepared by Atomic Layer Deposition”, J. Electrochem. Soc., vol. 155, no. 10, pp. G189-G193, Aug. 2008.