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Formation of Low-resistivity Nickel Germanide Using Atomic Layer Deposited Nickel Thin Film
Journal
IEEE Transactions on Electron Devices
Author
Hyun Jun Ahn, Jungmin Moon, Yujin Seo, Tae In Lee, Choong Ki Kim, Hyun-Yong Yu, Wan Sik Hwang and Byung Jin Cho
Year
2017
Date
April. 2017.

Hyun Jun Ahn, Jungmin Moon, Yujin Seo, Tae In Lee, Choong Ki Kim, Hyun-Yong Yu, Wan Sik Hwang and Byung Jin Cho, "Formation of Low-resistivity Nickel Germanide Using Atomic Layer Deposited Nickel Thin Film", IEEE Transactions on Electron Devices, vol. 64, no. 6, pp. 2599-2603, April. 2017.