Copolymer-based flexible resistive random access memory prepared by initiated chemical vapor deposition process
- Journal
- Advanced Electronic Materials
- Vol
- 7 (10)
- Page
- 2100375. 1-2100375. 8
- Year
- 2021
TJaejoong Jeong, Min Ju Kim, Wan Sik Hwang, and Byung Jin Cho, "Copolymer-based flexible resistive random access memory prepared by initiated chemical vapor deposition process", Advanced Electronic Materials, vol. 7, no. 10, pp. 2100375. 1-2100375. 8, Oct. 2021.