High quality Si1-xGex nanowire and its application to MOSFET integrated with HfO2/TaN/Ta gate stack
- Year
- 2007
- Author
- W. F. Yang, S. J. Lee, S. J. Whang, S. Y. Lim, B. J. Cho and D. L. Kwong
- Conference
- SSDM 2007
W. F. Yang, S. J. Lee, S. J. Whang, S. Y. Lim, B. J. Cho and D. L. Kwong,“High quality Si1-xGex nanowire and its application to MOSFET integrated with HfO2/TaN/Ta gate stack”, SSDM 2007.