A novel Hafnium Carbide Metal Gate Electrode for NMOS Device Application
- Year
- 2007
- Author
- W. S. Hwang, C. Shen, X. P. Wang, D. S. H. Chan, and B. J. Cho,
- Conference
- 2007 Symposium on VLSI Technology
W. S. Hwang, C. Shen, X. P. Wang, D. S. H. Chan, and B. J. Cho, “A novel Hafnium Carbide Metal Gate Electrode for NMOS Device Application”, 2007 Symposium on VLSI Technology, pp. 156-157, Kyoto, Japan, Jun., 2007.
Jun., 2007.
Kyoto, Japan