Damage free etching of RuO2 in O2/He plasma,
- Year
- 2006
- Author
- W. S. Hwang, V. N. Bliznetsov, B. J. Cho, D. S. H. Chan, and W. J. Yoo,
- Conference
- 28th International Symposium on Dry Process
W. S. Hwang, V. N. Bliznetsov, B. J. Cho, D. S. H. Chan, and W. J. Yoo, "Damage free etching of RuO2 in O2/He plasma", 28th International Symposium on Dry Process, Nagoya, Japan, November 2006.
November 2006.
Nagoya, Japan