Dual metal gate process scheme for wide range work function modulation and reduced Fermi level pinning
- Year
- 2005
- Author
- B. J. Cho, C. S. Park, P. W. Lwin, S. Y. Wong, J. Pu, W. S. Hwang, L. J. Tang, W. Y. Loh, and D. L. Kwong,
- Conference
- 3rd International Conference on Materials for Advanced Technologies, Symposium H
B. J. Cho, C. S. Park, P. W. Lwin, S. Y. Wong, J. Pu, W. S. Hwang, L. J. Tang, W. Y. Loh, and D. L. Kwong, "Dual metal gate process scheme for wide range work function modulation and reduced Fermi level pinning", 3rd International Conference on Materials for Advanced Technologies, Symposium H: Silicon Microelectronics: Processing to Packaging, p. 41, MRS Singapore, July 2005.
July 2005.
MRS Singapore