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Total 378건 20 페이지

2005
93

"Evaluation of SOHOS (polysilicon-oxide-high-K-oxide-silicon) structure for Flash memory device application" Y. N. Tan, B. J. Cho, W. K. Chim, W. K. Choi, M. S. Joo, and T. H. Ng,, 3rd International Conference on Materials for Advanced Technologies, Symposium G, 2005
92

"Integration of Dual Metal Gate/High-K dielectric Stacks for Fermi-Level Pinning Free" B. J. Cho, The 2nd International Workshop on Nanoscale Semiconductor Devices, 2005
91

"High Capacitance Density (>17fF/um2) Nb2O5-based MIM capacitors for Future RF IC Application" S. J. Kim, B. J. Cho, M. B. Yu, M. F. Li, Y. Z. Xiong, C. Zhu, A. Chin, and D. L. Kwong, 2005 Symposium on VLSI Technology, 2005
90

"Dual Metal Gate Process by Metal Substitution of Dopant-Free Polysilicon on High-K Dielectric" C. S. Park, B. J. Cho, W. S. Hwang, W. Y. Loh, L. J. Tang, and D. L. Kwong,, 2005 Symposium on VLSI Technology, 2005
89

"Technical challenges in Front-End Processes for next generation CMOS devices" B. J. Cho, AMSEA ET (Applied Materials South East Asia Engineering & Technology) Conference 2005, 2005
88

"Metal Electrode (Panel Presentation)" B. J. Cho, 2nd International Symposium on Advanced Gate Stack Technology, 2005
87

"Metal gate/high-K dielectric stack on Si cap/ultra-thin pure Ge epi/Si substrate" C. C. Yeo, M. H. Lee, C. W. Liu, K. J. Choi, T. W. Lee, and B. J. Cho, Proceedings on 2005 IEEE Conference on Electron Devices and Solid-State Circuits, 2005
2004
86

"Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization" B. J. Cho, D. Poon, L. S. Tan, M. Bhat, A. See, IEEE 4th International Workshop on Junction Technology (IWJT-2004),, 2004
85

"Dual Metal and fully silicided metal gate processes with tunable workfunction" B. J. Cho, International NanoElectronics Materials Conference,, 2004
84

"Dual metal gate CMOS with tunable work function and high-K gate dielectrics" B. J. Cho, The 1st International Workshop on Nanoscale Semiconductor Devices, 2004
83

"Engineering of Voltage Nonlinearity in High-K MIM Capacitor for Analog/Mixed-Signal ICs" S. J. Kim, B. J. Cho, M. F. Li, S. J. Ding, M. B. Yu, C. Zhu, A. Chin, and D. L.Kwong, 2004 Symposium on VLSI Technology, 2004
82

"A comparison study of high-density MIM capacitors with ALD HfO2-Al2O3 laminated, sandwiched and stacked dielectrics" S. J. Ding, H. Hu, C. Zhu, S. J. Kim, M. F. Li, B. J. Cho, A. Chin, and D. L. Kwong, Internaional Conference on Solid State and Integrated Circuit Technology (ICSICT), 2004
81

"Behavior of Effective Work Function in Metal/High-K Gate Stack under High Temperature ProcessI" M. S. Joo, B. J. Cho, D. Z. Chi, N. Balasubramanian, and D. L. Kwong,, International Conf. on Solid State Devices and Materials (SSDM), The Japan Society of Applied Physics, 2004
80

"Top-Surface Aluminized and Nitrided Hafnium Oxide Using Synthesis of Thin AlN and HfO2 Stacked Layer" C. S. Park, B. J. Cho, L. J. Tang, W. Wang, and D. L. Kwong,, International Conf. on Solid State Devices and Materials (SSDM),The Japan Society of Applied Physics, 2004
79

"High performance RF MOSFETs and passive devices on Si" A. Chin, C. H. Lai, Z. M. Lai, C. F. Lee, C. Zhu, M. F. Li, B. J. Cho, and D. L.Kwong, 2004 Asia-Facific Microwave Conference, 2004

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