Dual metal gate CMOS with tunable work function and high-K gate dielectrics
- Year
- 2004
- Author
- B. J. Cho
- Conference
- The 1st International Workshop on Nanoscale Semiconductor Devices
B. J. Cho, "Dual metal gate CMOS with tunable work function and high-K gate dielectrics", The 1st International Workshop on Nanoscale Semiconductor Devices, Seoul, Korea, May 2004. (Invited).
May 2004.
Seoul, Korea