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Total 378건 21 페이지

2004
78

"Hafnium-oxide-based high-K metal-insulator-metal capacitors (MIMCAPs) for RF/analog CMOS technologies (Invited)" B. J. Cho, S. J. Kim, M. F. Li, and M. B. Yu, 2004 Asia-Facific Microwave Conference, 2004
77

"High-K HfAlO Charge Trapping Layer in SONOS-type Nonvolatile Memory Device for High Speed Operation" Y. N. Tan, W. K. Chim, W. K. Choi, J. M. Sig, N. T. Hau and B. J. Cho,, International Electron Device Meeting (IEDM), 2004
76

"Substituted Aluminum Metal Gate on high-K Dielectric for low work-function and Fermi-Level Pinning Free" C. S. Park, B. J. Cho, L. J. Tang, and D. L. Kwong, International Electron Device Meeting (IEDM), 2004
2003
75

"A comparative study of multiple and single pulse laser annealing for ultrashallow boron junction formation" D.Poon, B. J. Cho, Y. F. Lu, M. Bhat, and A. See,, Ultra-Shallow Junctions-2003 Workshop,, 2003
74

"Process optimization for multiple-pulse laser annealing of boron implanted silicon with germanium pre-amorphization" D.Poon, B. J. Cho, Y. F. Lu, M. Bhat, and A. See, 2003 MRS Spring Meeting, MRS Symposium D: CMOS Front-End Materials and Process Technology, 2003
73

"Photoluminescene from silicon nanocrystals formed by pulsed laser deposition" X. Y. Chen, Y. F. Lu, Y. H. Wu, B. J. Cho, W. D. Song, H. Hu, MRS Symposium, 2003
72

"Silicon nanostructured films formed by pulsed-laser deposition in inert gas and reactive gas" X. Y. Chen, Y. F. Lu, Y. H. Wu, B. J. Cho, H. Hu, MRS Symposium Proceedings Vol. 762, 2003
71

"Material and electrical characterization of HfO2 films for MIM capacitors applications" H.Hu, C. Zhu, Y. F. Lu, J. N. Zeng, Y. H. Wu, Y. F. Liew, M. F. Li, B. J. Cho, W. K. Choi, MRS Spring meeting,, 2003
70

"Growth and characterization of hafnium oxide thin films prepared by MOCVD" C. S. Fong, V. L. S. Wei, R. G. Krishnam, A. Trigg, L. K. Bera, S. Mathew, N. Balasubramanian, M. S. Joo, C. C. Yeo, and B. J. Cho, 2003 International conference on Characterisation and Metrology for ULSI technology, 2003
69

"MIM capacitors with HfO2 and HfAlOx for Si RF and analog applications" X. Yu, C. Zhu, H. Hu, A. Chin, M. F. Li, B. J. Cho, D. L. Kwong, P. D. Foo, and M. B. Yu,, MRS Spring meeting, 2003
68

"Electrical and physical properties of Si1-xGex/HfO2/Si MOS-capacitors" N. Wu, C. Zhu, N. Balasubramanian, C. C. Yeo, M. S. Joo, H. Y. Yu, Q. C. Zhang, L. K. Bera, B. J. Cho, M. F. Li, S. J. Whoang, 2nd International Conference on Materials for Advanced Technologies,, 2003
67

"Study of PVD HfO2 and HfOxNy as dielectrics for MIM capacitor application" H. F. Lim, S. J. Kim, H. Hu, X. F. Yu, H. Y. Yu, M. F. Li, B. J. Cho, C. Zhu, A. Chin, D. L. Kwong, 2nd International Conference on Materials for Advanced Technologies, 2003
66

"Physical and electrical properties of MOCVD HfAlxOy gate dielectric and their composition ratio dependence" M. S. Joo, B. J. Cho, C. C. Yeo, Y. L. Ching, W. Y. Loh, S. J. Whoang, S. Mathew, L. K. Bera, N. Balasubramanian, and D. L. Kwong, 2nd International Conference on Materials for Advanced Technologies, 2003
65

"Effect of annealing on the composition and structure of HfO2 and nitrogen incorporated HfO2" C. C. Yeo, B. J. Cho, M. S. Joo, S. J. Whang, D. L. Kwong, L. K. Bera, S. Mathew, N. Balasubramanian, 2nd International Conference on Materials for Advanced Technologies, 2003
64

"Electrical evaluation of laser annealed junctions by Hall measurement" D. C. H. Poon, B. J. Cho, L. S. Tan, M. Bhat, and L. Chan,, 2nd International Conference on Materials for Advanced Technologies, 2003

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