Investigation of PVD HfO2 MIM capacitors for Si RF and Mixed signal ICs application
- Year
- 2003
- Author
- H. Hang, S. J. Ding, C. Zhu, S. C. Rustagi, Y. F. Lu, M. F. Li, B. J. Cho, D. S. H. Chan, M. B. Yu, A. Chin, D. L. Kwong
- Conference
- International semiconductor device research symposium
H. Hang, S. J. Ding, C. Zhu, S. C. Rustagi, Y. F. Lu, M. F. Li, B. J. Cho, D. S. H. Chan, M. B. Yu, A. Chin, D. L. Kwong, "Investigation of PVD HfO2 MIM capacitors for Si RF and Mixed signal ICs application", International semiconductor device research symposium, washington DC, December, 2003.
December, 2003.
washington DC
