Improving electrical properties of CVD HfO2 by multi-step deposition and annealing in a gate cluster tool
- Year
- 2003
- Author
- C. C. Yeo, B. J. Cho, M. S. Joo, S. J. Whoang, D. L. Kwong, L. K. Bera, S. Mathew, N. Balasubramanian
- Conference
- International Conf. on Solid State Devices and Materials (SSDM), The Japan Society of Applied Physics
C. C. Yeo, B. J. Cho, M. S. Joo, S. J. Whoang, D. L. Kwong, L. K. Bera, S. Mathew, N. Balasubramanian, "Improving electrical properties of CVD HfO2 by multi-step deposition and annealing in a gate cluster tool", International Conf. on Solid State Devices and Materials (SSDM), The Japan Society of Applied Physics, Japan, Sept. 2003.
Sept. 2003
Japan,