HfO2 and Lanthanide-doped HfO2 MIM capacitors for RF/Mixed IC applications
- Year
- 2003
- Author
- S. J. Kim, B. J. Cho, M. F. Li, C. Zhu, A. Chin, and D. L. Kwong,
- Conference
- 2003 Symposium on VLSI Technology, Digest of Technical Papers
S. J. Kim, B. J. Cho, M. F. Li, C. Zhu, A. Chin, and D. L. Kwong, "HfO2 and Lanthanide-doped HfO2 MIM capacitors for RF/Mixed IC applications", 2003 Symposium on VLSI Technology, Digest of Technical Papers, pp. 77, Kyoto, Japan, June 2003.
June 2003.
Kyoto, Japan